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1.The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma

Author	Andok Robert 1973- SAVINFO - Ústav informatiky SAV
Co-authors	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV
	Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV
	Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV
	Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV
	Škriniarová Jaroslava
Source document	Journal of Electrical Engineering. Vol. 64, no. 6 (2013), p. 371-375
Category	ADNA - Scientific papers in domestic impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2013
DOI	10.2478/jee-2013-0056

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