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The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma
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$a The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma 463 -1
$1 001 sav_un_epca*040122 $1 011 $a 1335-3632 $1 200 1 $a Journal of Electrical Engineering $b [serial] $v Vol. 64, no. 6 (2013), p. 371-375 700 -1
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Number of the records: 1