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The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma
Title The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV Škriniarová Jaroslava Source document Journal of Electrical Engineering. Vol. 64, no. 6 (2013), p. 371-375 Category ADNA - Scientific papers in domestic impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2013 DOI 10.2478/jee-2013-0056 
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Number of the records: 1