1. The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma
Author : \q12*sav_un_auth*1 0001417 \q \q1013 sav_un_auth*0001417 \d Andok Robert 1973- \q SAVINFO - Ústav informatiky SAV
Co-authors : \q12*sav_un_auth*1 0157167 \q \q1013 sav_un_auth*0157167 \d Benčurová Anna 1966- \q SAVINFO - Ústav informatiky SAV
: \q12*sav_un_auth*1 0001130 \q \q1013 sav_un_auth*0001130 \d Hrkút Pavol 1948- \q SAVINFO - Ústav informatiky SAV
: \q12*sav_un_auth*1 0001133 \q \q1013 sav_un_auth*0001133 \d Konečníková Anna 1955- \q SAVINFO - Ústav informatiky SAV
: \q12*sav_un_auth*1 0001134 \q \q1013 sav_un_auth*0001134 \d Matay Ladislav 1950- \q SAVINFO - Ústav informatiky SAV
: \q12*sav_un_auth*1 0164040 \q \q1013 sav_un_auth*0164040 \d Nemec Pavol 1975- \q SAVINFO - Ústav informatiky SAV
: \q12*sav_un_auth*1 0079546 \q \q1013 sav_un_auth*0079546 \d Škriniarová Jaroslava \q
Source document : \q12**1 040122 \q Journal of Electrical Engineering. Vol. 64, no. 6 (2013), p. 371-375
Category : ADNA - Scientific papers in domestic impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022) : V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document : článok
Year : 2013
DOI : 10.2478/jee-2013-0056