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The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma
Názov The AZ 5214E resist in EBDW lithography and its use as a RIE etch-mask in etching thin Ag layers in N2 plasma Autor Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Spoluautori Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Škriniarová Jaroslava Zdroj.dok. Journal of Electrical Engineering. Vol. 64, no. 6 (2013), p. 371-375 Jazyk dok. eng - angličtina Krajina SK - Slovenská republika Druh dok. rozpis článkov z periodík (rbx) Ohlasy ZHUKOV, A.A. - ILYIN, E.Y. - GERASIMENKO, N.N. Influence of photolithographic process conditions on obtaining a negative tilt of thick positive photoresist mask. InIzvestija vysšich učebnych zavedenij, elektronika. ISSN 1561-5405, 2015, vol. 20, no. 4, pp. 440-442. VAIDULYCH, Mykhailo - HANUS, Jan - STEINHARTOVA, Tereza - KYLIAN, Ondrej - CHOUKOUROV, Andrei - BERANOVA, Jana - KHALAKHAN, Ivan - BIEDERMAN, Hynek. Deposition of Ag/a-C:H nanocomposite films with Ag surface enrichment. In PLASMA PROCESSES AND POLYMERS. ISSN 1612-8850, 2017, vol. 14, no. 11, pp. TOBING, Landobasa Y. M. - MUELLER, Aaron D. - TONG, Jinchao - ZHANG, Dao Hua. Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high aspect ratio nanogaps. In NANOTECHNOLOGY. ISSN 0957-4484, 2019, vol. 30, no. 42, pp. ZHAO, Shaoqing - ZHANG, Han - LIU, Yu-Qing - HUANG, Long - GUAN, Ruihua - CHEN, Yanpin - CONG, Yuxuan - HONG, Zhihan - WANG, Zhi - LIU, Hua. Spatial Light Modulator-based printing technologies for optical elements fabrication with different materials. In JOURNAL OF MANUFACTURING PROCESSES, 2025, vol. 144, no., pp. 60-77. ISSN 1526-6125. Dostupné na: https://doi.org/10.1016/j.jmapro.2025.04.019. ALHASAN, Seba Nur - MIRBAKHT, S. Sajjad - GULER, Saygun - SAHIN, Osman - UMAR, Muhammad - KUZUBASOGLU, Burcu Arman - YAPICI, Murat Kaya. Artificially Weaved Textile-like Surface Micromachined Graphene-Polymer Flexible Bioelectrodes. In ADVANCED MATERIALS TECHNOLOGIES, 2025, vol. 10, no. 14. ISSN 2365-709X. Dostupné na: https://doi.org/10.1002/admt.202402032. SATO, Mina - TOHNISHI, Mie - FUJIMOTO, Miho - MATSUTANI, Akihiro. Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks. In SENSORS AND MATERIALS, 2025, vol. 37, no. 3. ISSN 0914-4935. Dostupné na: https://doi.org/10.18494/SAM5547. Kategória ADNA - Vedecké práce v domácich impaktovaných časopisoch registrovaných vo WOS Core Collection alebo SCOPUS Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2013 Registrované v WOS Registrované v SCOPUS DOI 10.2478/jee-2013-0056 
článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2013 2012 0.546 Q4 0.160
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